Robust surface-subsurface modification of PDMS through atmospheric pressure atomic layer deposition

Albert Santoso; Bart J. van den Berg; Saeed Saedy; Eden Goodwin; Volkert van Steijn; J. Ruud Van Ommen

doi:10.3897/arphapreprints.e105413

Preprint

ARPHA Preprints
https://doi.org/10.3897/arphapreprints.e105413 (02 May 2023)

Published in: Atomic Layer Deposition https://doi.org/10.3897/aldj.1.105146

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ARPHA Preprints

doi: 10.3897/arphapreprints.e105413

First posted 02 May 2023

Authors

Albert Santoso

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Bart J. van den Berg

TU Delft, Delft, Netherlands

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Saeed Saedy

TU Delft, Delft, Netherlands

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Eden Goodwin

Carleton University, Ottawa, Canada

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Volkert van Steijn

TU Delft, Delft, Netherlands

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J. Ruud Van Ommen

- Corresponding author

TU Delft, Delft, Netherlands

https://www.tudelft.nl/tnw/over-faculteit/afdelingen/chemical-engineering/principal-scientists/ruud-van-ommen

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Author contributions

AS, VvS, JRO: conceptualizing, writing manuscript; AS, BvdB, SS, EG: collecting and analyzing data, writing; VvS, JRO: supervising

Conflict of interest

The authors have declared that no competing interests exist.

Supporting agencies

NWO - Nederlandse Organisatie voor Wetenschappelijk Onderzoek

This is an open access preprint distributed under the terms of the Creative Commons Attribution License (CC BY 4.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original author and source are credited.